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Accueil > Séminaires et conférences > Séminaires, soutenances de thèses et HDR précédents > 2008 > Séminaires 2008 > Lundi 20 octobre 2008 à 14h

Lundi 20 octobre 2008 à 14h

Pr. Daan Schram
Université Technique - Eindhoven

Is the plasma nature essential in plasma chemistry ?

Lundi 20 octobre à 14h

Bibliothèque LPTP

The properties and the uses of plasmas are based on the creation of radicals which lead to the action. In this way it looks similar to hot chemical vapor chemistry. The large radical densities however lead to a different chemistry, also at the surface. The electrons are the essential ingredient and thus they form the essence of plasma processes. Plasmas as a non-equilibrium system form thus a new physical way for processes. At the hand of a global picture the potential of low density plasmas will be discussed.
Electrons are thus the beginning of the chemistry, radicals follow, these radicals interact at the palsma modified surface and produce molecules, which can be excited. The latter ones and radicals can be the source of negative ion production, which on their turn can be the beginning of association to larger molecules. If alternatively negative ions
need to be extracted then specific conditions are needed, which translate in requirements on plasma parameters.


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Tutelles : CNRS Ecole Polytechnique Sorbonne Université Université Paris Sud Observatoire de Paris Convention : CEA
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